Company Profile

Suzhou New Dimension Nano Technology Co., Ltd. is a high-tech enterprise dedicated to the R&D and commercialization​ of advanced nanoimprint lithography (NIL) processes.

 

We operate a state-of-the-art micro/nano fabrication platform integrating master template fabrication, R&D, pilot production, and high-volume manufacturing. This platform achieves resolutions down to 20 nm​ for both development and mass production across diverse material systems—providing turnkey technical support from device design to large-scale manufacturing.

 

Our core product portfolio includes AR waveguides, diffractive optical elements (DOE), wire grid polarizers (WGP), nanoimprint templates, metalenses, and biochips. These solutions serve key markets​ including micro/nano optics, biotechnology, advanced sensing, electromagnetic modulation, and next-generation displays.

 

Building on our high-precision NIL platform, we are executing an open-access foundry strategy. We are committed to pushing process boundaries, expanding technological frontiers, and fostering a world-leading micro/nano manufacturing ecosystem.

发展历程


2023

2023

New Dimension

The first domestic conference on nanoimprint technology, bringing together researchers and industry professionals (the NTAC Conference), has been held.

2022

2022

New Dimension

New Dimension has been established, marking the world’s first high-tech contract manufacturing company centered on nanoimprint lithography technology.

2014

2014

Swedish company Obducat

The first fully automated nanoimprint lithography system has been applied to the manufacturing of bio‑micro needle products.

2008

2008

Swedish company Obducat

The first fully automated nanoimprint lithography system has been applied to the fabrication of patterned substrates for LEDs.

2005

2005

Swedish company Obducat

Invented the soft-template transfer technique, marking the starting point for the industrial-scale commercialization of nanoimprinting.

2000

2000

Swedish company Obducat

The world’s first commercial nanoimprint lithography system was developed at Obducat.

Technical Expertise


Corporate Culture


自主仿真

Our Values

Integrity, Diligence, Compassion No shortcuts to excellence People-focused, Customer-centric Continuous improvement

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Our Vision

Building world-leading nanoimprint industrialization technology—empowering "Made in China" with nanometer precision and opening new dimensions for humanity's better future.

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Our Mission

Constructing a world-class micro-nano manufacturing platform.

Awards and Certifications


Qualifications

Intellectual Property

2022: National-level Talent (NDNANO Founder)

2022: Suzhou Industrial Park Technology Leading Talent

2023: Suzhou First Batch New Display Industry Application Demonstration Case

2023: Technology-based SME

2024: Suzhou Gusu Entrepreneurial Leading Talent

2024: Innovation-based SME

2024: National High-tech Enterprise

2024: Suzhou "Unicorn" Cultivation Enterprise

2025: Jiangsu Province Potential Unicorn Enterprise

2025: China 2025 Sci-Tech Future Star Enterprise

2025: Suzhou "Unicorn" Cultivation Enterprise

We have established a comprehensive patent portfolio around nanoimprint technology:

46 patent applications filed, with 20 patents granted (13 invention patents, 7 utility model patents)

All nanoimprint-related patents were independently developed by NDNANO founder (National-level Talent, Suzhou Industrial Park Technology Leading Talent) and his team—fully proprietary and controllable, primarily for internal company use.

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