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Double-Sided Alignment Nanoimprint Lithography
Double-sided alignment nanoimprint lithography enables simultaneous or sequential high-precision pattern alignment and transfer on both substrate surfaces. This technology overcomes traditional single-sided imprint limitations, opening new pathways for complex micro-nano structure fabrication. <br/> <br/> Our capabilities include: <br/> <br/> 1.Nanometer-level double-sided pattern alignment precision <br/> 2.High efficiency through simultaneous double-sided pattern transfer <br/> 3.Foundation for 3D integrated device manufacturing <br/> 4.Material compatibility with various polymers, biomaterials, and functional materials <br/>
Nanoimprint Lithography Process Capability — Template Fabrication Capability
The New Dimension Technology team possesses state-of-the-art, high-precision mold‑fabrication capabilities, enabling the production of molds spanning a wide range of dimensions—from tens of nanometers to several micrometers—and fabricated from diverse materials, including silicon‑based substrates, metals, polymers, and glass. This fully meets the stringent requirements of micro‑ and nano‑devices for high integration and intricate structural features.
Nanoprinting Process Capability — High-Precision Alignment of Templates
The New Dimension technology team possesses advanced pattern‑tiling capabilities for large‑area templates, enabling: <br/> 1. Large-area pattern fabrication: Enables the production of optical components with larger dimensions; <br/> 2. Fabrication of Complex Micro- and Nanostructures: Meeting the Requirements for Pattern Creation Across Diverse Scales and Geometries <br/> 3. Improve production efficiency and reduce production costs