Nanoprinting Process Capability — High-Precision Alignment of Templates
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The New Dimension Technology team possesses advanced pattern‑tiling capabilities for large‑area templates, enabling:
1. Large‑area pattern fabrication: By employing tiling techniques, it is possible to produce optical components of larger dimensions, thereby meeting market demand. At present, the R&D center can perform high‑precision nanoimprint lithography on 8‑inch wafers; work is ongoing to establish a large‑area G2.5‑generation (370 mm × 470 mm) nanoimprint lithography platform, enabling the processing of an even broader range of products.
2. Fabrication of Complex Micro- and Nanostructures: By accommodating patterning requirements across diverse sizes and shapes, it enables the flexible fabrication of a wide range of intricate micro- and nanostructures.
3. Enhancing production efficiency and reducing costs: It enables the simultaneous fabrication of multiple devices or patterns, thereby minimizing downtime associated with mask fabrication and tooling changes, which in turn helps lower production costs. This is of great significance for large-scale industrial manufacturing.
Figure: Template alignment accuracy of 20 ± 5 µm, on an 8-inch wafer, with a line-width resolution of 50 nm.
Figure: Panel-scale nanoimprint with a grating structure, measuring 500 mm × 500 mm.
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Building D, 102-104, 388 Ruoshui Road, Suzhou Industrial Park, China