High-Level Nanoimprint Lithography Foundry with 20nm process capability

Delivering comprehensive micro-nano manufacturing solutions powered by advanced nanoimprint technology

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World-Class Nanoimprint Manufacturing Platform

A fully integrated semiconductor-level nanoimprint Fab facility, encompassing master template fabrication, R&D lines, pilot production, and volume manufacturing capabilities.

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PRODUCTS


Our core offerings cover AR waveguides, wire grid polarizers (WGP), metalenses, and biochips, nanoimprint templates, diffractive optical elements (DOE) — serving applications from consumer optics to life sciences.

PRECISION MANUFACTURING


FOCUS ON ADVANCED NANOIMPRINT LITHOGRAPHY (NIL)


COMPREHENSIVE FABRICATION & R&D CAPABILITIES

New Dimension Nano Technologies Co., Ltd. is a high-tech specialist in advanced nanoimprint lithography (NIL), withR&D and process foundry at its core. Backed by over 20 years of expertise in micro/nano structure

imprinting, we are market-driven and focused on the fabrication of micro-nano optical elements.

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NEWS CENTER


Every day, before heading to work, the red glow of the QR‑code payment when buying breakfast, the smooth, razor‑sharp edge of a smartphone screen, and even the pinpoint beam used to precisely polish the lens during refractive surgery—all conceal the same beam of light: the laser. This “artificial divine light,” now woven into the fabric of our daily lives, actually took more than a century to go from theoretical inception to everyday reality. Today, we’ll trace this century‑long story step by step, and delve into the “behind‑the‑scenes enablers” that empower lasers—DOE optical elements—as well as the high‑precision micro‑ and nano‑fabrication techniques—namely nanoimprint lithography—that have made their mass production and widespread adoption possible.

2026-04-22