Major Announcement | The General Manager of Suzhou New Dimension has been invited to attend the Third Photomask and Photoresist Technology Forum and deliver a keynote speech.
Release time:
2026-04-24 10:55
An industry‑leading event ushers in a new chapter, as cutting‑edge technologies pave the way for fresh collaborations. The highly anticipated 3rd Photomask and Photoresist Technology Forum will be held in Shanghai on April 24, 2026. This forum will spotlight the latest technological advances, industry trends, and partnership opportunities in the photomask and photoresist sectors, bringing together industry leaders, academic experts, and corporate representatives to discuss the future of sectoral development.
As a seasoned player in the micro‑ and nano‑manufacturing sector, Suzhou New Dimension Micro‑Nano Technology Co., Ltd. has been invited to participate in this forum. Dr. Luo Gang, the company’s general manager, will take the stage as a keynote speaker to present his report, “Manufacturing of Micro‑ and Nano‑Optical Devices on a Full‑Ecology Industrial Platform Based on Nanoimprint Lithography.” He will engage with attendees in an in-depth discussion of emerging trends, technological breakthroughs, and potential collaboration opportunities in the field of micro‑ and nano‑optical device fabrication, paving the way for new avenues of industrial innovation.
Suzhou New Dimension Micro‑Nano Technology Co., Ltd. is steadfastly committed to the R&D and industrialization of micro‑nano manufacturing technologies. Centered on building a specialized nanoimprint fab with high precision, the company aims to refine its nanoimprint process capabilities, deeply empower the entire product lifecycle, and deliver end-to-end solutions that span process implementation, rapid iteration, pilot‑scale R&D, and large‑scale production.
The company’s core business encompasses micro- and nano‑structured devices such as AR lenses, diffractive optical elements (DOEs), metal‑aluminum wire‑grid polarizers (WGP), nanoimprint templates, metalens, and biochips. Its products are widely deployed in cutting‑edge fields including micro‑ and nano‑optics, biochips, sensing and detection, electromagnetic manipulation, and next‑generation displays. Currently, the company has completed the construction of a high‑precision nanoimprint fabrication platform tailored for the micro‑ and nano‑manufacturing industry, integrating nanoimprint template fabrication, R&D lines, pilot‑scale production lines, and mass‑production lines. With capabilities to fabricate features down to the 20‑nanometer scale, the company has mastered processing technologies across multiple material systems, enabling it to provide customers with end‑to‑end technical support and comprehensive service—from device design through large‑scale manufacturing.
Looking ahead, Suzhou New Dimension will continue to anchor itself in a high‑precision nanoimprint fabrication platform, pursuing an open‑architecture micro‑ and nanomanufacturing foundry as its strategic direction. By deepening its capabilities in high‑precision process technologies and pushing the boundaries of manufacturing processes, the company is committed to building a world‑leading micro‑ and nanomanufacturing ecosystem, thereby driving high‑quality growth across the industry.
On April 24, at the 3rd Shanghai Photomask and Photoresist Technology Forum, Dr. Luo Gang will deliver a highly informative keynote presentation. Industry professionals are cordially invited to attend and join Suzhou New Dimension in exploring innovative applications of micro‑ and nano‑optical technologies, embarking together on a new chapter of industry development!
—Forum Agenda—
Previous Page
Previous Page
Relevant news
OUR PROMISE
We provide comprehensive support across the entire product lifecycle—encompassing design realization, rapid process optimization, and scalable mass production.
CONTACT US
Building D, 102-104, 388 Ruoshui Road, Suzhou Industrial Park, China