Nanoimprint Lithography Process Capability — Template Fabrication Capability
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The templates used in nanoimprint lithography can be employed to fabricate a wide range of nanoscale structures and patterns, including nanoimprint silicon masters, stitching templates, and production molds.
The New Dimension Technology team possesses state-of-the-art, high-precision mold replication capabilities, enabling the fabrication of molds spanning a wide range of dimensions—from tens of nanometers to several micrometers—and encompassing diverse materials such as silicon, metals, polymers, and glass. This technology delivers highly accurate, high‑quality pattern replication, fully meeting the stringent requirements of micro‑ and nano‑devices for high integration and fine structural features, while also ensuring exceptional product yield. As a result, it provides robust support for the large‑scale, efficient production of micro‑ and nanoscale products.
OUR PROMISE
We provide comprehensive support across the entire product lifecycle—encompassing design realization, rapid process optimization, and scalable mass production.
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Building D, 102-104, 388 Ruoshui Road, Suzhou Industrial Park, China