Double-Sided Alignment Nanoimprint Lithography
Release time:
In nanoimprint lithography, alignment technology is a critical step, with alignment accuracy directly impacting device performance and yield. The New Dimension Technology team possesses high-precision alignment capabilities, enabling nanometer‑level alignment that effectively reduces product defects, boosts manufacturing yield, and lowers production costs.
Figure: Alignment accuracy within a 6-inch wafer: less than 1 µm
OUR PROMISE
We provide comprehensive support across the entire product lifecycle—encompassing design realization, rapid process optimization, and scalable mass production.
CONTACT US
Building D, 102-104, 388 Ruoshui Road, Suzhou Industrial Park, China