NIL technology has been igniting innovation for three decades! The 3rd NTAC Nanolithography and Applications Conference is set to take place with great momentum.
Release time:
2026-01-04 11:09
As the first domestic professional conference dedicated to research and industrial applications in the field of nanoimprint lithography, the NTAC Global Nanoimprint Technology and Applications Conference has been successfully held twice. Renowned researchers and industry representatives from both China and abroad have gathered to focus on the latest advances and applications of nanoimprint technology, thoroughly examine industry challenges and future directions, and offer strategic insights to drive technological breakthroughs and industrial upgrading. The NTAC Conference has firmly established itself as a premier platform for exchange in the nanoimprint technology sector, continuously injecting intellectual vitality into the industry’s development.
In 2025, it will mark the 30th anniversary of the birth of nanoimprint lithography. The 3rd NTAC Nanolithography and Applications Conference, together with the special events commemorating the 30th anniversary of nanolithography technology, will be themed “ Thirty Years of Technological Innovation: Pioneering a New Future in Nanoimprint Lithography As one of the flagship conferences of CHInano 2025, the 15th China International Nanotechnology Industry Expo, under the theme… Will be grandly held at the Suzhou International Expo Center on October 22–23, 2025. 。
Conference Organization
Organizer:
Gusu Laboratory
Organizing Unit:
Suzhou New Dimension Micro-Nano Technology Co., Ltd.
Co-organizers:
Suzhou Nanotechnology Development Co., Ltd.
Time and place
Meeting time:
October 22–23
Meeting Location:
Hall A, Suzhou International Expo Center
Guest lineup
The Third NTAC Conference It will once again continue the tradition of previous editions. Internationalization, high standards The overall framework, with a special invitation to a member of the U.S. National Academy of Engineering. Professor Stephen Y. Chou 、 Professor Emeritus, Lund University, Sweden Professor Lars Montelius Wait More than 20 people Top experts from China, the United States, Germany, Sweden, and many other countries scholar Share cutting-edge reports with industry leaders. The conference will provide an in-depth analysis of the latest nanolithography technologies, as well as industry development trends and application prospects. Together, we will pool our expertise to overcome the bottlenecks hindering the advancement of nanoimprint lithography, vigorously driving technological innovation and industrial takeoff in China’s manufacturing sector, and, as we embark on a new chapter in the 30-year evolution of nanoimprint technology, write an even more illustrious story.
Leading Guest
Zhou Yu — inventor of nanoimprint lithography, member of the U.S. National Academy of Engineering, and Joseph C. Elgin Professor at Princeton University.
Lars Montelius— one of the pioneers of nanoimprint lithography, Professor Emeritus at Lund University, and founder of Obducat AB.
Michael Steigerwald——Raith CEO
Helmut Schift — Head of the Advanced Nanomanufacturing Technologies Group at the Paul Scherrer Institute (PSI), Switzerland
Chen Yifang — Professor at Fudan University
Chen Linsen — Professor at Soochow University and Chairman of Suzhou Sudawei Ge Technology Group Co., Ltd.
Guo Lingjie — Professor at the University of Michigan
The conference speakers are being confirmed one by one.
Time and place
Meeting Arrangements:
Meeting Location:
Hall A, Suzhou International Expo Center
Fee Standards
|
Payment deadline |
General attendees (/person) |
Student attendees (/person) |
|
Before August 31 |
2,400 yuan |
1,000 yuan |
|
Before October 21 |
2,600 yuan |
1,400 yuan |
|
On-site payment |
3,000 yuan |
1,800 yuan |
Contact for participation: Ms. Zhang 15261825960 (WeChat ID is the same)
The lineup of guests has been announced, and a series of compelling presentations are in store.
October 22–23, 2025
The 3rd NTAC Global Conference on Nanoimprint Technology and Applications
Will open in Suzhou.
You are cordially invited to attend the conference.
Scan the code to register now and enjoy an early-bird discount—while supplies last!
Join us for this industry event that brings together the power of innovation!
Meeting
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