A resounding success! The Third Nanolithography Technology Application Conference and the 30th Anniversary of Nanolithography: Paying Tribute to the Past, Embracing the Future
Release time:
2026-01-04 15:55
October 22, The 15th China International Nanotechnology Industry Expo Grandly inaugurated! The Third NTAC Global Nanoprinting Technology and Applications Conference, one of the flagship forums of CHInano 2025—the 15th China International Nanotechnology Industry Expo—was successfully held at the Suzhou International Expo Center. Notably, this year marks the 30th anniversary of the birth of nanoprinting technology, lending the event an especially significant dimension: it not only showcases the remarkable achievements of the past three decades but also serves as a crucial opportunity to chart the course for future technological advancement.
Diverse partnerships, jointly building a platform for exchange.
This conference is organized by Hosted by the Gusu Laboratory and organized by Suzhou New Dimension Micro‑Nano Technology Co., Ltd., with support from Suzhou Nanotechnology Development Co., Ltd., Obducat, Raith China, Shanghai Chexin Technology Co., Ltd., and Liman Technology (Wuxi) Co., Ltd. This NTAC conference brought together 21 leading experts and technology pioneers from top universities, research institutions, and industry leaders both at home and abroad, who engaged in in-depth discussions on the latest research advances, process innovations, and industrial applications of nanoimprint lithography. The event aims to foster academic exchange and collaboration, accelerate the commercialization of nanoimprint technology, and inject fresh momentum into the industry’s development.
During the conference, leading experts and scholars in the field of nanoimprint lithography presented their latest research advances and findings.
In addition, Professor Lingjie Guo of the University of Michigan, USA, Dr. Helmut Schift, head of the Advanced Nanomanufacturing Technology Group at the Paul Scherrer Institute in Switzerland; Professor Luo Feng of Nankai University; Professor Cheng Xin of the Southern University of Science and Technology; Professor Ge Haixiong of Nanjing University; and Professor Wang Liang of the University of Science and Technology of China. renowned scholars It also featured engaging presentations by attendees, who shared their latest research findings.
In addition, the conference has also invited Cui Wanyin, General Manager of Nanuo 3D Technology (Shanghai) Co., Ltd., and Deng Mengmeng, General Manager of Pulin Technology (Hangzhou) Co., Ltd., Peng Bofang, General Manager of Shanghai Chexin Technology Co., Ltd., Heidelberg Senior Sales Engineer Wu Zhengming, Deputy General Manager of Jiangsu Youzhong Micro‑Nano Semiconductor Technology Co., Ltd. Ju Fayin, EV Group Regional Sales Manager Tu Shuxue, and Eastern China Regional Sales Manager of Delu Industrial Adhesives Company Chen Yun, Wang Da, President of the Shenzhen Micro- and Nano-Manufacturing Industry Promotion Association Great They delivered outstanding presentations to the attendees.
Anniversary Grand Celebration: A Roundtable Dialogue with Industry Leaders
To mark the milestone of the 30th anniversary of nanoimprint lithography, the conference has specially organized a roundtable discussion titled “Thirty Years of Technological Innovation: Pioneering a New Future for Nanoimprint.” The session proudly brings together trailblazers in the field—leading scholars and industry pioneers who have long championed the advancement and application of this technology—to engage in an in-depth dialogue around three key themes: “progress, challenges, and vision.” Through this exchange, the panel will trace the evolution of the technology, build industry-wide consensus, and chart a course for its future.
The on-site exchange of ideas was vigorous, with topics unfolding in ever-deepening layers. This session not only paid tribute to past achievements but also marked a solemn departure into the future, underscoring that, after three decades of steady development, nanoimprint technology continues to thrive with robust innovative vitality and boundless commercial potential.
Here, we would like to extend our special thanks to Suzhou Nanotechnology Development Co., Ltd., Raith China, Shanghai Chexin Technology Co., Ltd., Obducat, and Liman Technology (Wuxi) Co., Ltd. for their support in organizing the conference, which ensured its smooth execution.
The third NTAC has concluded successfully, yet our journey of exploration continues unabated. Nanoimprint lithography is steadily expanding its frontiers of application, demonstrating broad industrialization prospects and vibrant innovation.
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